发明授权
US07871914B2 Methods of fabricating semiconductor devices with enlarged recessed gate electrodes
有权
制造具有放大的凹陷栅电极的半导体器件的方法
- 专利标题: Methods of fabricating semiconductor devices with enlarged recessed gate electrodes
- 专利标题(中): 制造具有放大的凹陷栅电极的半导体器件的方法
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申请号: US12431488申请日: 2009-04-28
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公开(公告)号: US07871914B2公开(公告)日: 2011-01-18
- 发明人: Seong-Ho Kim , Chang-Sub Lee , Jeong-Dong Choe , Sung-Min Kim , Shin-Ae Lee , Dong-Gun Park
- 申请人: Seong-Ho Kim , Chang-Sub Lee , Jeong-Dong Choe , Sung-Min Kim , Shin-Ae Lee , Dong-Gun Park
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR2002-81091 20021218
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
A semiconductor device includes a semiconductor substrate having a recess therein. A gate insulator is disposed on the substrate in the recess. The device further includes a gate electrode including a first portion on the gate insulator in the recess and a second reduced-width portion extending from the first portion. A source/drain region is disposed in the substrate adjacent the recess. The recess may have a curved shape, e.g., may have hemispherical or ellipsoid shape. The source/drain region may include a lighter-doped portion adjoining the recess. Relate fabrication methods are also discussed.
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