Invention Grant
- Patent Title: Method for manufacturing surface-emitting laser
- Patent Title (中): 表面发射激光器的制造方法
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Application No.: US12166378Application Date: 2008-07-02
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Publication No.: US07879632B2Publication Date: 2011-02-01
- Inventor: Mitsuhiro Ikuta
- Applicant: Mitsuhiro Ikuta
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-198489 20070731
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Provided is a method for manufacturing a surface-emitting laser capable of forming a photonic crystal structure inside a semiconductor highly accurately and easily without direct bonding. It is a method by laminating on a substrate a plurality of semiconductor layers including an active layer and a semiconductor layer having a photonic crystal structure formed therein, the method including the steps of forming a second semiconductor layer on a first semiconductor layer to form the photonic crystal structure, forming a plurality of microholes in the second semiconductor layer, forming a low refractive index portion in a part of the first semiconductor layer via the plurality of microholes thereby to provide the first semiconductor layer with the photonic crystal structure having a one-dimensional or two-dimensional refractive index distribution in a direction parallel to the substrate, and forming a third semiconductor layer by crystal regrowth from a surface of the second semiconductor layer.
Public/Granted literature
- US20090035884A1 METHOD FOR MANUFACTURING SURFACE-EMITTING LASER Public/Granted day:2009-02-05
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