Invention Grant
- Patent Title: Method and device for mutual contacting of two wafers
- Patent Title (中): 两片晶片相互接触的方法和装置
-
Application No.: US11572105Application Date: 2005-07-11
-
Publication No.: US07882997B2Publication Date: 2011-02-08
- Inventor: Elke Zakel , Ghassem Azdasht
- Applicant: Elke Zakel , Ghassem Azdasht
- Applicant Address: DE Nauen
- Assignee: Pac Tech-Packaging Technologies GmbH
- Current Assignee: Pac Tech-Packaging Technologies GmbH
- Current Assignee Address: DE Nauen
- Agency: McGlew and Tuttle, P.C.
- Priority: DE102004034421 20040715
- International Application: PCT/DE2005/001230 WO 20050711
- International Announcement: WO2006/005327 WO 20060119
- Main IPC: B23K37/04
- IPC: B23K37/04

Abstract:
A method and a device for the mutual contacting of two wafer-type component composite configurations made of multiple identical components which are implemented coherently, in particular a semiconductor wafer (12) with a functional component wafer (14), to produce electronic assemblies on the wafer level, in which the component composite configurations are each situated on a receptacle unit (11; 13) and the contact pressure necessary for the contacting between contact metallizations of the component composite configurations to be connected to one another is generated in such a way that a vacuum is generated in a contact chamber which receives the component composite configurations and is delimited by the receptacle units, and the contacting of the contact metallizations is performed by a rear energy impingement of a component composite configuration.
Public/Granted literature
- US20080171404A1 Method and Device For Mutual Contacting of Two Wafers Public/Granted day:2008-07-17
Information query
IPC分类: