发明授权
- 专利标题: Laser thin film poly-silicon annealing optical system
- 专利标题(中): 激光薄膜多晶硅退火光学系统
-
申请号: US11201877申请日: 2005-08-11
-
公开(公告)号: US07884303B2公开(公告)日: 2011-02-08
- 发明人: William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
- 申请人: William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
- 申请人地址: US CA San Diego
- 专利权人: TCZ LLC
- 当前专利权人: TCZ LLC
- 当前专利权人地址: US CA San Diego
- 代理机构: Procopio Cory Hargreaves & Savitch LLP
- 代理商 Noel C. Gillespie
- 主分类号: B23K26/00
- IPC分类号: B23K26/00
摘要:
A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
公开/授权文献
- US20050269300A1 Laser thin film poly-silicon annealing optical system 公开/授权日:2005-12-08
信息查询