公开(公告)号：US20120267348A1

公开(公告)日：2012-10-25

申请号：US13458572

申请日：2012-04-27

申请人： Brandon A. Turk ,  David S. Knowles

发明人： Brandon A. Turk ,  David S. Knowles

IPC分类号： B23K26/06

CPC分类号： B23K26/0738

摘要： A thin beam directional crystallization system configured to process a substrate comprises a laser configured to produce laser light, the laser configured to have a high energy mode and a low energy mode. The high energy mode is configured to produce light energy sufficient to completely melt a substrate coated with amorphous silicon film, while the low energy mode is configured to produce light energy that is not sufficient to completely melt a substrate coated with amorphous silicon film. The system further comprises beam shaping optics configured to convert the laser light emitted from the laser into a long thin beam with a short axis and a long axis, a stage configured to support the substrate and film, and a translator coupled with the stage, the translator configured to advance the substrate and film so as to produce a step size in conjunction with the firing of the laser.

摘要翻译： 配置成处理衬底的薄射束定向结晶系统包括被配置为产生激光的激光器，所述激光器被配置为具有高能量模式和低能量模式。 高能量模式被配置为产生足以完全熔化涂覆有非晶硅膜的基板的光能，而低能量模式被配置为产生不足以完全熔化涂覆有非晶硅膜的基板的光能。 该系统还包括光束整形光学器件，其被配置为将从激光器发射的激光转换成具有短轴和长轴的长的细束，被配置为支撑衬底和膜的台，以及与该台耦合的转换器， 翻转器被配置为推进基板和膜，以便与激光的点火一起产生台阶。

公开(公告)号：US07884303B2

公开(公告)日：2011-02-08

申请号：US11201877

申请日：2005-08-11

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： B23K26/00

CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率 陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。

公开(公告)号：US08927898B2

公开(公告)日：2015-01-06

申请号：US11381052

申请日：2006-05-01

申请人： Brandon A. Turk ,  David S. Knowles

发明人： Brandon A. Turk ,  David S. Knowles

IPC分类号： B23K26/00 ,  B23K26/03 ,  B23K26/073

CPC分类号： B23K26/0738

摘要： In a thin beam directional Crystallization System configured anneal a silicon layer on a glass substrate uses a special laser beam profile with an intensity peak at one edge. The system is configured to entirely melt a spatially controlled portion of a silicon layer causing lateral crystal growth. By advancing the substrate or laser a certain step size and subjecting the silicon layer to successive “shots” rom the laser, the entire silicon layer is crystallized. The lateral crystal growth creates a protrusion in the center of the melt area. This protrusion must be re-melted. Accordingly, the step size must be such that there is sufficient overlap between successive shots, i.e., melt zones, to ensure the protrusion is melted. This requires the step size to be less than half the beam width. A smaller step size reduces throughput and increases costs. The special laser profile used in accordance with the systems and methods described herein can increase the step size and thereby increase throughput and reduce costs.

摘要翻译： 在配置退火的薄光束定向晶化系统中，玻璃基板上的硅层使用在一个边缘具有强度峰值的特殊激光束分布。 该系统被配置为完全熔化导致横向晶体生长的硅层的空间受控部分。 通过使衬底或激光器前进一定的步长并使硅层经受连续的激光照射，整个硅层被结晶。 横向晶体生长在熔体区域的中心产生突起。 该突起必须再熔化。 因此，台阶尺寸必须使得连续的镜头即熔体区域之间存在足够的重叠，以确保突起被熔化。 这需要步长小于波束宽度的一半。 较小的步距可以减少吞吐量并增加成本。 根据本文所述的系统和方法使用的特殊激光轮廓可以增加步长，从而增加产量并降低成本。

公开(公告)号：US08362391B2

公开(公告)日：2013-01-29

申请号：US12979292

申请日：2010-12-27

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： B23K26/00

CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。

公开(公告)号：US08183498B2

公开(公告)日：2012-05-22

申请号：US11673980

申请日：2007-02-12

申请人： Brandon A. Turk ,  David S. Knowles

发明人： Brandon A. Turk ,  David S. Knowles

IPC分类号： B23K26/00

CPC分类号： B23K26/0738

摘要： A thin beam directional crystallization system configured to process a substrate comprises a laser configured to produce laser light, the laser configured to have a high energy mode and a low energy mode. The high energy mode is configured to produce light energy sufficient to completely melt a substrate coated with amorphous silicon film, while the low energy mode is configured to produce light energy that is not sufficient to completely melt a substrate coated with amorphous silicon film. The system further comprises beam shaping optics coupled to the laser and configured to convert the laser light emitted from the laser into a long thin beam with a short axis and a long axis, a stage configured to support the substrate and film, and a translator coupled with the stage, the translator configured to advance the substrate and film so as to produce a step size in conjunction with the firing of the laser.

摘要翻译： 配置成处理衬底的薄射束定向结晶系统包括被配置为产生激光的激光器，所述激光器被配置为具有高能量模式和低能量模式。 高能量模式被配置为产生足以完全熔化涂覆有非晶硅膜的基板的光能，而低能量模式被配置为产生不足以完全熔化涂覆有非晶硅膜的基板的光能。 该系统还包括耦合到激光器并被配置为将从激光器发射的激光转换成具有短轴和长轴的长薄光束的光束成形光学器件，被配置为支撑衬底和膜的平台，以及耦合到 在平台中，翻译器被配置为推进基底和膜，以便与激光的烧制一起产生步长。

公开(公告)号：US20110163077A1

公开(公告)日：2011-07-07

申请号：US12979292

申请日：2010-12-27

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： B23K26/06 ,  B23K26/00

CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。