Invention Grant
- Patent Title: Nonvolatile memory devices and methods of fabricating the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US11980346Application Date: 2007-10-31
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Publication No.: US07884410B2Publication Date: 2011-02-08
- Inventor: Chang-wook Moon , Joong S. Jeon , El Mostafa Bourim , Hyun-deok Yang
- Applicant: Chang-wook Moon , Joong S. Jeon , El Mostafa Bourim , Hyun-deok Yang
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2006-0115425 20061121
- Main IPC: H01L29/94
- IPC: H01L29/94 ; H01L21/8242 ; H01L27/108

Abstract:
Example embodiments may provide nonvolatile memory devices and example methods of fabricating nonvolatile memory devices. Example embodiment nonvolatile memory devices may include a switching device on a substrate and/or a storage node electrically connected to the switching device. A storage node may include a lower metal layer electrically connected to the switching device, a first insulating layer, a middle metal layer, a second insulating layer, an upper metal layer, a carbon nanotube layer, and/or a passivation layer stacked on the lower metal layer.
Public/Granted literature
- US20080191261A1 Nonvolatile memory devices and methods of fabricating the same Public/Granted day:2008-08-14
Information query
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