发明授权
US07892703B2 CPL mask and a method and program product for generating the same
有权
CPL掩码和用于生成CPL掩码的方法和程序产品
- 专利标题： CPL mask and a method and program product for generating the same
- 专利标题（中）： CPL掩码和用于生成CPL掩码的方法和程序产品
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申请号： US11501916申请日： 2006-08-10
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公开(公告)号： US07892703B2公开(公告)日： 2011-02-22
- 发明人: Jang Fung Chen , Duan-Fu Stephen Hsu , Douglas Van Den Broeke , Jung Chul Park , Thomas Laidig
- 申请人： Jang Fung Chen , Duan-Fu Stephen Hsu , Douglas Van Den Broeke , Jung Chul Park , Thomas Laidig
- 申请人地址： NL AH Veldhoven
- 专利权人： ASML Masktools B.V.
- 当前专利权人： ASML Masktools B.V.
- 当前专利权人地址： NL AH Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F7/00
摘要：
A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of obtaining data representing the plurality of features; and forming at least one of the plurality of features by etching a substrate to form a mesa and depositing a chrome layer over the entire upper surface of the mesa, where said mesa has a predetermined height.
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