发明授权
US07893449B2 Gallium nitride based compound semiconductor light-emitting device having high emission efficiency and method of manufacturing the same 有权
具有高发光效率的氮化镓系化合物半导体发光元件及其制造方法

  • 专利标题: Gallium nitride based compound semiconductor light-emitting device having high emission efficiency and method of manufacturing the same
  • 专利标题(中): 具有高发光效率的氮化镓系化合物半导体发光元件及其制造方法
  • 申请号: US12097054
    申请日: 2006-12-13
  • 公开(公告)号: US07893449B2
    公开(公告)日: 2011-02-22
  • 发明人: Naoki FukunagaHironao ShinoharaHiroshi Osawa
  • 申请人: Naoki FukunagaHironao ShinoharaHiroshi Osawa
  • 申请人地址: JP Tokyo
  • 专利权人: Showa Denko K.K.
  • 当前专利权人: Showa Denko K.K.
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Sughrue Mion, PLLC
  • 优先权: JP2005-360288 20051214; JP2005-360289 20051214
  • 国际申请: PCT/JP2006/324856 WO 20061213
  • 国际公布: WO2007/069651 WO 20070621
  • 主分类号: H01L29/22
  • IPC分类号: H01L29/22
Gallium nitride based compound semiconductor light-emitting device having high emission efficiency and method of manufacturing the same
摘要:
The present invention provides a gallium nitride based compound semiconductor light-emitting device having high light emission efficiency and a low driving voltage Vf. The gallium nitride based compound semiconductor light-emitting device includes a p-type semiconductor layer, and a transparent conductive oxide film that includes dopants and is formed on the p-type semiconductor layer. A dopant concentration at an interface between the p-type semiconductor layer and the transparent conductive oxide film is higher than the bulk dopant concentration of the transparent conductive oxide film. Therefore, the contact resistance between the p-type semiconductor layer and the transparent conductive oxide film is reduced.
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