发明授权
- 专利标题: Semiconductor device and method of manufacturing semiconductor device
- 专利标题(中): 半导体装置及其制造方法
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申请号: US12339128申请日: 2008-12-19
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公开(公告)号: US07897483B2公开(公告)日: 2011-03-01
- 发明人: Shunpei Yamazaki , Hidekazu Takahashi , Daiki Yamada , Yohei Monma , Hiroki Adachi
- 申请人: Shunpei Yamazaki , Hidekazu Takahashi , Daiki Yamada , Yohei Monma , Hiroki Adachi
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2007-339385 20071228
- 主分类号: H01L21/30
- IPC分类号: H01L21/30
摘要:
Objects are to reduce damage to a semiconductor integrated circuit by external stress and to increase the manufacturing yield of a thinned semiconductor integrated circuit. A single crystal semiconductor layer separated from a single crystal semiconductor substrate is used for a semiconductor element included in the semiconductor integrated circuit. Moreover, a substrate which is formed into a thin shape and provided with the semiconductor integrated circuit is covered with a resin layer. In a separation step, a groove for separating a semiconductor element layer is formed in the supporting substrate, and a resin layer is provided over the supporting substrate in which the groove is formed. After that, the resin layer and the supporting substrate are cut in the groove so as to be divided into a plurality of semiconductor integrated circuits.
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