发明授权
- 专利标题: Semiconductor wafer coat layers and methods therefor
- 专利标题(中): 半导体晶片涂层及其方法
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申请号: US11801465申请日: 2007-05-09
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公开(公告)号: US07897486B2公开(公告)日: 2011-03-01
- 发明人: Eric J. Li , Daoqiang Lu , Christopher L. Rumer , Paul A. Koning , Darcy E. Fleming , Gudbjorg H. Oskarsdottir , Tiffany Byrne
- 申请人: Eric J. Li , Daoqiang Lu , Christopher L. Rumer , Paul A. Koning , Darcy E. Fleming , Gudbjorg H. Oskarsdottir , Tiffany Byrne
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Blakely, Sokoloff, Taylor & Zafman LLP
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Formulations and processes for forming wafer coat layers are disclosed. In one embodiment, an organic surface protectant is incorporated into a wafer coat formulation deposited onto a semiconductor wafer prior to the laser scribe operation. Upon removal of the wafer coat layer, the organic surface protectant remains on the bumps and thereby prevents oxidation of the bumps between die prep and chip and attach. In an alternative embodiment, an ultraviolet light absorber is added to the wafer coat formulation to enhance the wafer coat layer's energy absorption and thereby improve the laser's ability to ablate the wafer coat layer. In an alternative embodiment, a conformal wafer coat layer is deposited on the wafer and die bumps, thereby reducing wafer coat layer thickness variations that can impact the laser scribing ability.
公开/授权文献
- US20070218652A1 Semiconductor wafer coat layers and methods therefor 公开/授权日:2007-09-20
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