发明授权
US07902597B2 Transistors with laterally extended active regions and methods of fabricating same
失效
具有横向延伸的有源区域的晶体管及其制造方法
- 专利标题: Transistors with laterally extended active regions and methods of fabricating same
- 专利标题(中): 具有横向延伸的有源区域的晶体管及其制造方法
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申请号: US12025877申请日: 2008-02-05
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公开(公告)号: US07902597B2公开(公告)日: 2011-03-08
- 发明人: Sung-Sam Lee , Min-Hee Cho
- 申请人: Sung-Sam Lee , Min-Hee Cho
- 申请人地址: KR Suwon-Si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si, Gyeonggi-do
- 代理机构: Volentine & Whitt, PLLC
- 优先权: KR10-2007-0019088 20070226
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
A transistor and method of fabricating the transistor are disclosed. The transistor is disposed in an active region of a substrate defined by an isolation region and includes a gate electrode and associated source/drain regions. The isolation region includes an upper isolation region and an lower isolation region, wherein the upper isolation region is formed with sidewalls having, at least in part, a positive profile.
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