发明授权
- 专利标题： Thermal processing furnace, gas delivery system therefor, and methods for delivering a process gas thereto
- 专利标题（中）： 热处理炉，气体输送系统及其处理气体的输送方法
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申请号： US11277814申请日： 2006-03-29
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公开(公告)号： US07910494B2公开(公告)日： 2011-03-22
- 发明人: Anthony Dip , Eric J. Malstrom
- 申请人： Anthony Dip , Eric J. Malstrom
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Wood, Herron & Evans, LLP
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; C30B23/03
摘要：
A gas delivery system for supplying a process gas from a gas supply to a thermal processing furnace, a thermal processing furnace equipped with the gas delivery system, and methods for delivering process gas to a thermal processing furnace. The gas delivery system comprises a plurality of regulators, such as mass flow controllers, in a process gas manifold coupling a gas supply with a thermal processing furnace. The regulators establish a corresponding plurality of flows of a process gas at a plurality of flow rates communicated by the process gas manifold to the thermal processing furnace. The gas delivery system may be a component of the thermal processing furnace that further includes a liner that surrounds a processing space inside the thermal processing furnace.