发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US11961221申请日: 2007-12-20
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公开(公告)号: US07910923B2公开(公告)日: 2011-03-22
- 发明人: Tetsuya Hayashi , Masakatsu Hoshi , Hideaki Tanaka , Shigeharu Yamagami
- 申请人: Tetsuya Hayashi , Masakatsu Hoshi , Hideaki Tanaka , Shigeharu Yamagami
- 申请人地址: JP Yokohama-shi, Kanagawa
- 专利权人: Nissan Motor Co., Ltd.
- 当前专利权人: Nissan Motor Co., Ltd.
- 当前专利权人地址: JP Yokohama-shi, Kanagawa
- 代理商 Young Basile
- 优先权: JP2006-346107 20061222
- 主分类号: H01L29/04
- IPC分类号: H01L29/04
摘要:
A semiconductor device with superior long-term reliability is disclosed that alleviates current concentration into a switch structure arranged at an outermost portion. The semiconductor device comprises hetero semiconductor regions formed of polycrystalline silicon having a band gap width different from that of a drift region and hetero-adjoined with the drift region, a gate insulation film, a gate electrode adjoined to the gate insulation film, a source electrode connected to a source contact portion of the hetero semiconductor regions and an outermost switch structure and a repeating portion switch structure with a drain electrode connected to a substrate region. In a conduction state, the outermost switch structure comprises a mechanism in which the current flowing at the outermost switch structure becomes smaller than the current flowing at the repeating portion switch structure.
公开/授权文献
- US20080210938A1 SEMICONDUCTOR DEVICE 公开/授权日:2008-09-04
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