发明授权
US07925090B2 Method of determining photo mask, method of manufacturing semiconductor device, and computer program product
失效
确定光掩模的方法，制造半导体器件的方法以及计算机程序产品
- 专利标题： Method of determining photo mask, method of manufacturing semiconductor device, and computer program product
- 专利标题（中）： 确定光掩模的方法，制造半导体器件的方法以及计算机程序产品
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申请号： US11601797申请日： 2006-11-20
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公开(公告)号： US07925090B2公开(公告)日： 2011-04-12
- 发明人: Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
- 申请人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2005-336183 20051121
- 主分类号： G06K9/34
- IPC分类号： G06K9/34
摘要：
A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.
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