发明授权
US07927425B2 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same
有权
使用该等离子体增强化学气相沉积的动力输送机构和装置
- 专利标题: Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same
- 专利标题(中): 使用该等离子体增强化学气相沉积的动力输送机构和装置
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申请号: US11847316申请日: 2007-08-29
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公开(公告)号: US07927425B2公开(公告)日: 2011-04-19
- 发明人: Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
- 申请人: Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
- 申请人地址: TW Hsinchu
- 专利权人: Industrial Technology Research Institute
- 当前专利权人: Industrial Technology Research Institute
- 当前专利权人地址: TW Hsinchu
- 代理机构: WPAT., P.C.
- 代理商 Justin King
- 优先权: TW96119236A 20070530
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; C23C16/458 ; C23C16/509 ; H01L21/3065
摘要:
A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
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