发明授权
US07927425B2 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same 有权
使用该等离子体增强化学气相沉积的动力输送机构和装置

Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same
摘要:
A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
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