发明授权
- 专利标题: Elastic wave element containing a silicon oxide film and a silicon nitride oxide film
- 专利标题(中): 包含氧化硅膜和氮氧化硅膜的弹性波元件
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申请号: US12532426申请日: 2008-05-09
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公开(公告)号: US07928633B2公开(公告)日: 2011-04-19
- 发明人: Yukio Iwasaki , Hiroki Kamiguchi , Yosuke Hamaoka
- 申请人: Yukio Iwasaki , Hiroki Kamiguchi , Yosuke Hamaoka
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: RatnerPrestia
- 优先权: JP2007-138591 20070525; JP2008-082801 20080327
- 国际申请: PCT/JP2008/001165 WO 20080509
- 国际公布: WO2008/146449 WO 20081204
- 主分类号: H01L41/04
- IPC分类号: H01L41/04 ; H03H9/145
摘要:
An elastic wave element includes a piezoelectric substrate, an interdigital electrode provided on the piezoelectric substrate, a silicon oxide film covering the interdigital electrode, and a silicon nitride oxide film provided on the silicon oxide film. A film thickness H of the silicon oxide film and a wave length λ of an elastic wave propagating through the piezoelectric substrate satisfies a relation of H/λ≧0.15. The elastic wave element reduces fluctuation of propagation characteristics of elastic waves, and has high reliability.
公开/授权文献
- US20100060101A1 ELASTIC WAVE ELEMENT 公开/授权日:2010-03-11
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