发明授权
US07936003B2 Semiconductor device having transistor with vertical gate electrode and method of fabricating the same
失效
具有具有垂直栅电极的晶体管的半导体器件及其制造方法
- 专利标题: Semiconductor device having transistor with vertical gate electrode and method of fabricating the same
- 专利标题(中): 具有具有垂直栅电极的晶体管的半导体器件及其制造方法
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申请号: US11344560申请日: 2006-01-31
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公开(公告)号: US07936003B2公开(公告)日: 2011-05-03
- 发明人: Sang-Woo Kang , Jeong-Uk Han , Yong-Tae Kim , Seung-Beom Yoon
- 申请人: Sang-Woo Kang , Jeong-Uk Han , Yong-Tae Kim , Seung-Beom Yoon
- 申请人地址: KR Suwon-Si, Gyeonggi-Do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si, Gyeonggi-Do
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2005-0010056 20050203; KR10-2005-0066383 20050721
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
A semiconductor device includes transistors with a vertical gate electrode. In a transistor structure, a semiconductor pattern has first and second sides facing in a transverse direction, and third and fourth sides facing in a longitudinal direction. Gate patterns are disposed adjacent to the first and second sides of the semiconductor pattern. Impurity patterns directly contact the third and fourth sides of the semiconductor pattern. A gate insulating pattern is interposed between the gate patterns and the semiconductor pattern.
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