Invention Grant
US07943017B2 Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source
有权
用于操作脉冲电弧蒸发源和包括所述脉冲电弧蒸发源的真空处理系统的方法
- Patent Title: Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source
- Patent Title (中): 用于操作脉冲电弧蒸发源和包括所述脉冲电弧蒸发源的真空处理系统的方法
-
Application No.: US11908542Application Date: 2006-03-01
-
Publication No.: US07943017B2Publication Date: 2011-05-17
- Inventor: Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
- Applicant: Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
- Applicant Address: CH Trubbach
- Assignee: Oerlikon Trading AG, Trubbach
- Current Assignee: Oerlikon Trading AG, Trubbach
- Current Assignee Address: CH Trubbach
- Agency: Natoro, Michalos & Zaccaria P.C.
- Priority: CH518/05 20050324; CH1289/05 20050803
- International Application: PCT/CH2006/000125 WO 20060301
- International Announcement: WO2006/099760 WO 20060928
- Main IPC: C23C14/00
- IPC: C23C14/00
Abstract:
A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.
Public/Granted literature
Information query
IPC分类:
