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    METHOD FOR DEPOSITING ELECTRICALLY INSULATING LAYERS
    2.
    发明申请
    METHOD FOR DEPOSITING ELECTRICALLY INSULATING LAYERS 有权
    沉积电绝缘层的方法

    公开(公告)号：US20090166188A1

    公开(公告)日：2009-07-02

    申请号：US12374319

    申请日：2007-07-12

    申请人： Juergen Ramm ,  Beno Widrig ,  Christian Wohlrab

    发明人： Juergen Ramm ,  Beno Widrig ,  Christian Wohlrab

    IPC分类号： C23C14/35

    CPC分类号： C23C14/325 ,  C23C14/081 ,  H01J37/32055 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3447 ,  H01J37/345 ,  H01J37/3467

    摘要： Method for producing low-conductivity layers, especially insulating layers, on at least one workpiece by vacuum coating, wherein an electrical arc discharge is operated between at least one anode and one cathode of an arc source in an atmosphere containing reactive gas, and only a small external magnetic field essentially perpendicular to the target surface or none at all is generated at the surface of a target electrically connected to the cathode to assist the evaporation process, the degree of recoating of the surface by other coating sources being less than 10%, and the magnetic field being generated by a magnet system that comprises at least one axially polarized coil with a geometry similar in size to the target.

    摘要翻译： 用于通过真空涂覆在至少一个工件上生产低电导率层，特别是绝缘层的方法，其中电弧放电在包含反应性气体的气氛中的电弧源的至少一个阳极和一个阴极之间运行，并且只有 基本上垂直于目标表面的小外部磁场或根本不产生在电连接到阴极的目标的表面以辅助蒸发过程，其它涂覆源的表面重涂程度小于10％ 并且所述磁场由磁体系统产生，所述磁体系统包括至少一个具有与所述目标尺寸相似的几何形状的轴向极化线圈。

    METHOD FOR REMOVING HARD CARBON LAYERS
    4.
    发明申请
    METHOD FOR REMOVING HARD CARBON LAYERS 有权
    去除硬碳层的方法

    公开(公告)号：US20140224768A1

    公开(公告)日：2014-08-14

    申请号：US14124394

    申请日：2012-05-31

    申请人： Jürgen Ramm ,  Beno Widrig

    发明人： Jürgen Ramm ,  Beno Widrig

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32064 ,  C23C16/0245 ,  H01J2237/3341 ,  H01L21/02376 ,  H01L21/31116 ,  H01L21/31122 ,  H01L29/66015

    摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

    摘要翻译： 本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。 因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电 室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。 低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

    Layer system with at least one mixed crystal layer of a multi-oxide
    7.
    发明申请
    Layer system with at least one mixed crystal layer of a multi-oxide 有权
    具有至少一个多氧化物混合晶层的层系统

    公开(公告)号：US20080090099A1

    公开(公告)日：2008-04-17

    申请号：US11548529

    申请日：2006-10-11

    申请人： Jurgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

    发明人： Jurgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

    IPC分类号： B32B9/00 ,  B29C35/08 ,  C23C16/00

    CPC分类号： C23C14/027 ,  B29C33/38 ,  B29C33/56 ,  B29K2907/04 ,  C23C14/0021 ,  C23C14/022 ,  C23C14/08 ,  Y10T428/12611 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/12667

    摘要： A PVD layer system for the coating of workpieces encompasses at least one mixed-crystal layer of a multi-oxide having the following composition: (Me11-xMe2x)2O3, where Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V. The elements of Me1 and Me2 differ from one another. The crystal lattice of the mixed-crystal layer in the PVD layer system has a corundum structure which in an x-ray diffractometrically analyzed spectrum of the mixed-crystal layer is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a multi-oxide, as well as correspondingly coated tools and components.

    摘要翻译： 用于涂覆工件的PVD层系统包括具有以下组成的多重氧化物的至少一个混晶层：（Me 1 1-x Me 2 x x） 其中Me1和Me2各自表示元素Al，Cr，Fe，Li，Mg，Mn，Nb，Ti，Sb或V中的至少一种。 Me1和Me2的元素彼此不同。 PVD层系统中的混晶层的晶格具有刚玉结构，其在混合晶体层的x射线衍射分析光谱中的特征在于与刚玉结构相关联的至少三条线。 还公开了一种用于制备多氧化物的混合层的真空涂覆方法，以及相应地涂覆的工具和组件。

    Method for removing hard carbon layers
    10.
    发明授权
    Method for removing hard carbon layers 有权
    去除硬碳层的方法

    公开(公告)号：US09230778B2

    公开(公告)日：2016-01-05

    申请号：US14124394

    申请日：2012-05-31

    申请人： Jürgen Ramm ,  Beno Widrig

    发明人： Jürgen Ramm ,  Beno Widrig

    IPC分类号： H01L21/302 ,  H01L21/461 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F3/00 ,  H01J37/32 ,  H01L21/311 ,  C23C16/02 ,  H01L21/02 ,  H01L29/66

    CPC分类号： H01J37/32064 ,  C23C16/0245 ,  H01J2237/3341 ,  H01L21/02376 ,  H01L21/31116 ,  H01L21/31122 ,  H01L29/66015

    摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

    摘要翻译： 本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。 因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电 室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。 低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。