发明授权
US07967930B2 Plasma reactor for processing a workpiece and having a tunable cathode
有权
用于处理工件并具有可调阴极的等离子体反应器
- 专利标题： Plasma reactor for processing a workpiece and having a tunable cathode
- 专利标题（中）： 用于处理工件并具有可调阴极的等离子体反应器
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申请号： US11589596申请日： 2006-10-30
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公开(公告)号： US07967930B2公开(公告)日： 2011-06-28
- 发明人: Richard Lewington , Michael N. Grimbergen , Khiem K. Nguyen , Darin Bivens , Madhavi R. Chandrachood , Ajay Kumar
- 申请人： Richard Lewington , Michael N. Grimbergen , Khiem K. Nguyen , Darin Bivens , Madhavi R. Chandrachood , Ajay Kumar
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理商 Robert M. Wallace
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; H01L21/306 ; C23C16/00
摘要：
A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and defining a support plane for supporting a workpiece. The cathode has a hollow space formed within its interior. The reactor further includes a movable metal element within the hollow space and a mechanism for controlling a distance between the metal element and the support plane.
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