发明授权
- 专利标题： Determining endpoint in a substrate process
- 专利标题（中）： 确定底物过程中的终点
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申请号： US12898672申请日： 2010-10-05
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公开(公告)号： US07969581B2公开(公告)日： 2011-06-28
- 发明人: Lei Lian , Matthew Fenton Davis
- 申请人： Lei Lian , Matthew Fenton Davis
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Janah & Associates, P.C.
- 主分类号： G01B11/02
- IPC分类号： G01B11/02
摘要：
An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the reflected polychromatic light. A wavelength of light is determined from the plurality of light beams, at which a local intensity of the reflected light is maximized.
公开/授权文献
- US20110019201A1 DETERMINING ENDPOINT IN A SUBSTRATE PROCESS 公开/授权日：2011-01-27
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