发明授权
- 专利标题： Method to create region specific exposure in a layer
- 专利标题（中）： 在图层中创建区域特定曝光的方法
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申请号： US10906268申请日： 2005-02-11
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公开(公告)号： US07977032B2公开(公告)日： 2011-07-12
- 发明人: Christos D. Dimitrakopoulos , Daniel C. Edelstein , Vincent J. McGahay , Satyanarayana V. Nitta , Kevin S. Petrarca , Shom Ponoth , Shahab Siddiqui
- 申请人： Christos D. Dimitrakopoulos , Daniel C. Edelstein , Vincent J. McGahay , Satyanarayana V. Nitta , Kevin S. Petrarca , Shom Ponoth , Shahab Siddiqui
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Roberts Mlotkowski Safran & Cole, P.C.
- 代理商 H. Daniel Schnurmann
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method of selectively altering material properties of a substrate in one region while making a different alteration of material properties in an adjoining region is provided. The method includes selectively masking a first portion of the substrate during a first exposure and selectively masking a second portion of the substrate during a second exposure. Additionally, a mask may be formed having more than one thickness where each thickness will selectively reduce the amount of energy from a blanket exposure of the substrate thereby allowing a substrate to receive different levels of energy dosage in a single blanket exposure.
公开/授权文献
- US20060183062A1 METHOD TO CREATE REGION SPECIFIC EXPOSURE IN A LAYER 公开/授权日：2006-08-17
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