Invention Grant
- Patent Title: Method for detaching layers with low magnetic permeability
- Patent Title (中): 低磁导率层分离方法
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Application No.: US12693503Application Date: 2010-01-26
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Publication No.: US07989225B2Publication Date: 2011-08-02
- Inventor: Shih-Cheng Huang
- Applicant: Shih-Cheng Huang
- Applicant Address: TW Hsinchu Hsien
- Assignee: Advanced Optoelectronic Technology, Inc.
- Current Assignee: Advanced Optoelectronic Technology, Inc.
- Current Assignee Address: TW Hsinchu Hsien
- Agent Raymond J. Chew
- Priority: CN200910305742 20090818
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for detaching a first material layer from a second material layer includes following steps. Firstly, a high-magnetic-permeability material layer is formed on a first material layer. Secondly, a second material layer is formed on the high-magnetic-permeability material layer. Thirdly, the first and second material layers are cooled such that the first and second material layers shrink, wherein the first and second material layers are low-magnetic-permeability materials. Finally, the high-magnetic-permeability material layer is heated by applying a high-frequency radiofrequency electromagnetic wave thereto such that the high-magnetic-permeability material layer expands, thus detaching the first material layer from the second material layer.
Public/Granted literature
- US20110045609A1 METHOD FOR DETACHING LAYERS WITH LOW MAGNETIC PERMEABILITY Public/Granted day:2011-02-24
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