发明授权
- 专利标题: Array substrate and method of fabricating the same
- 专利标题(中): 阵列基板及其制造方法
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申请号: US12591795申请日: 2009-12-01
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公开(公告)号: US07989850B2公开(公告)日: 2011-08-02
- 发明人: Hee-Dong Choi
- 申请人: Hee-Dong Choi
- 申请人地址: KR Seoul
- 专利权人: LG Display Co., Ltd.
- 当前专利权人: LG Display Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Mckenna Long & Aldridge LLP
- 优先权: KR10-2009-0067743 20090724
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L29/10 ; H01L31/00 ; H01L27/14 ; H01L29/15 ; H01L31/036 ; H01L29/18 ; H01L33/00 ; H01L27/118 ; H01L23/52 ; H01L29/66 ; H01L29/78 ; H01L21/70 ; H01L27/088 ; H01L27/082 ; H01L27/105 ; H01L27/12
摘要:
An array substrate includes first and second gate electrodes on a substrate; a gate insulating layer on the first and second gate electrodes; first and second active layers on the gate insulating layer; an interlayer insulating layer on the first and second active layers; first to fourth ohmic contact layers respectively contacting both sides of the first active layer and both sides of the second active layer; first and second source electrodes and first and second drain electrodes respectively on the first, third, second and fourth ohmic contact layers; a data line connected to the first source electrode; a first passivation layer connected to the first gate electrode; a power line; one end and the other end of a connection electrode respectively connected to the first drain electrode and the second gate electrode; a second passivation layer; and a pixel electrode-connected to the second drain electrode.
公开/授权文献
- US20110017999A1 Array substrate and method of fabricating the same 公开/授权日:2011-01-27
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