发明授权
- 专利标题: Monochromatic x-ray micro beam for trace element mapping
- 专利标题(中): 用于微量元素映射的单色x射线微光束
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申请号: US12063334申请日: 2006-07-26
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公开(公告)号: US07991116B2公开(公告)日: 2011-08-02
- 发明人: Zewu Chen , Ning Gao , Walter Gibson
- 申请人: Zewu Chen , Ning Gao , Walter Gibson
- 申请人地址: US NY East Greenbush
- 专利权人: X-Ray Optical Systems, Inc.
- 当前专利权人: X-Ray Optical Systems, Inc.
- 当前专利权人地址: US NY East Greenbush
- 代理机构: Heslin Rothenberg Farley & Mesiti P.C.
- 代理商 Jeffrey Klembczyk, Esq.; Kevin P. Radigan, Esq.
- 国际申请: PCT/US2006/028890 WO 20060726
- 国际公布: WO2007/019053 WO 20070215
- 主分类号: G21K1/06
- IPC分类号: G21K1/06 ; G21K1/00
摘要:
An x-ray system or method for exciting a sample under x-ray analysis, using a curved monochromating optic for directing a monochromatic x-ray beam from an x-ray source towards a first focal area. A second optic is positioned within, and receives, the monochromatic x-ray beam, and directs a focused x-ray beam towards a second focal area on the sample. A detector is positioned near the sample to collect radiation from the sample as a result of the focused x-ray beam. The curved monochromating optic produces a beam spot size at the first focal area larger than a beam spot size produced by the second optic at the second focal area, therefore, a beam spot size on the sample is thereby reduced using the second optic. Doubly-curved monochromating optics, and polycapillary optics, are disclosed as possible implementations of the optics.
公开/授权文献
- US20090161829A1 MONOCHROMATIC X-RAY MICRO BEAM FOR TRACE ELEMENT MAPPING 公开/授权日:2009-06-25
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