Invention Grant
- Patent Title: Apparatus and methods for ambient air abatement of electronic manufacturing effluent
- Patent Title (中): 环境空气减少电子制造废水的装置和方法
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Application No.: US12053480Application Date: 2008-03-21
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Publication No.: US08003067B2Publication Date: 2011-08-23
- Inventor: Mark W. Curry , Barry Page , Shaun W. Crawford , Robbert Vermeulen , William D. Pyzel , Youssef Loldj , Rene T. Correa , Daniel S. Brown , Allen Fox
- Applicant: Mark W. Curry , Barry Page , Shaun W. Crawford , Robbert Vermeulen , William D. Pyzel , Youssef Loldj , Rene T. Correa , Daniel S. Brown , Allen Fox
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Dugan & Dugan, PC
- Main IPC: B01D53/74
- IPC: B01D53/74
Abstract:
An abatement system is provided which includes 1) an abatement unit adapted to abate effluent; and 2) an ambient air supply system. The ambient air supply system includes an air moving device, wherein the ambient air supply system is adapted to supply ambient air to the abatement unit for use as an oxidant. Numerous other aspects are provided.
Public/Granted literature
- US20090078656A1 APPARATUS AND METHODS FOR AMBIENT AIR ABATEMENT OF ELECTRONIC DEVICE MANUFACTURING EFFLUENT Public/Granted day:2009-03-26
Information query
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