Invention Grant
- Patent Title: Nonvolatile memory device and method of operating and fabricating the same
- Patent Title (中): 非易失性存储器件及其操作和制造方法
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Application No.: US12805498Application Date: 2010-08-03
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Publication No.: US08004906B2Publication Date: 2011-08-23
- Inventor: Ki-ha Hong , Sung-hoon Lee , Jae-woong Hyun , Jai-kwang Shin , Young-gu Jin , Sung-il Park , Jong-seob Kim
- Applicant: Ki-ha Hong , Sung-hoon Lee , Jae-woong Hyun , Jai-kwang Shin , Young-gu Jin , Sung-il Park , Jong-seob Kim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2007-0058573 20070614
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
Provided is a method of reliably operating a highly integratable nonvolatile memory device. The nonvolatile memory device may include a string selection transistor, a plurality of memory transistors, and a ground selection transistor between a bit line and a common source line. In the nonvolatile memory device, data may be erased from the memory transistors by applying an erasing voltage to the bit line or the common source line.
Public/Granted literature
- US20100302870A1 Nonvolatile memory device and method of operating and fabricating the same Public/Granted day:2010-12-02
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