发明授权
- 专利标题: Method of high voltage operation of field effect transistor
- 专利标题(中): 场效应晶体管的高电压运行方法
-
申请号: US12283639申请日: 2008-09-12
-
公开(公告)号: US08012835B2公开(公告)日: 2011-09-06
- 发明人: Yutaka Hayashi , Hisashi Hasegawa , Yoshifumi Yoshida , Jun Osanai
- 申请人: Yutaka Hayashi , Hisashi Hasegawa , Yoshifumi Yoshida , Jun Osanai
- 申请人地址: JP JP
- 专利权人: Seiko Instruments Inc.,Yutaka Hayashi
- 当前专利权人: Seiko Instruments Inc.,Yutaka Hayashi
- 当前专利权人地址: JP JP
- 代理机构: Adams & Wilks
- 优先权: JP2004-048667 20040224; JP2004-318751 20041102
- 主分类号: H01L21/8234
- IPC分类号: H01L21/8234
摘要:
A high voltage operating field effect transistor has a source region and a drain region spaced apart from each other in a surface of a substrate. The source region is operative to receive at least one of a signal electric potential and a signal current. A semiconductor channel formation region is disposed in the surface of the substrate between the source region and the drain region. A gate region is disposed above the channel formation region and is operative to receive a bias electric potential having an absolute value equal to or larger than a first constant electric potential which changes according to an increase or decrease in a drain electric potential. A gate insulating film region is disposed between the channel formation region and the gate region.
公开/授权文献
信息查询
IPC分类: