发明授权
US08013365B2 CMOS image sensor configured to provide reduced leakage current
有权
CMOS图像传感器配置为提供减小的漏电流
- 专利标题: CMOS image sensor configured to provide reduced leakage current
- 专利标题(中): CMOS图像传感器配置为提供减小的漏电流
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申请号: US12403794申请日: 2009-03-13
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公开(公告)号: US08013365B2公开(公告)日: 2011-09-06
- 发明人: Ju-hyun Ko , Jong-jin Lee , Jung-chak Ahn
- 申请人: Ju-hyun Ko , Jong-jin Lee , Jung-chak Ahn
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR10-2008-0023472 20080313
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A complementary metal-oxide-semiconductor (CMOS) image sensor (CIS) includes a semiconductor substrate including a photodiode therein as a light sensing unit. A floating diffusion region of a first conductivity type is provided in the semiconductor substrate, and is configured to receive charges generated in the photodiode. A power supply voltage region of the first conductivity type is also provided in the semiconductor substrate. A reset transistor including a reset gate electrode on a surface of the substrate between the floating diffusion region and a power supply voltage region is configured to discharge charges stored in the floating diffusion region in response to a reset control signal. The reset transistor includes a channel region in the substrate extending between the floating diffusion region and the power supply voltage region such that the floating diffusion region and the power supply voltage regions define source/drain regions for the reset transistor. An impurity region is provided in a first portion of the channel region adjacent to the floating diffusion region. The impurity region has a doping such that the first portion of the channel region adjacent to the floating diffusion region has a different built-in potential than a second portion of the channel region adjacent to the power supply voltage region.
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