发明授权
- 专利标题: Nanoimprint resin stamper
- 专利标题(中): 纳米压印树脂压模
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申请号: US12270376申请日: 2008-11-13
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公开(公告)号: US08016585B2公开(公告)日: 2011-09-13
- 发明人: Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
- 申请人: Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, PC
- 优先权: JP2007-295458 20071114
- 主分类号: B29C59/00
- IPC分类号: B29C59/00 ; B29B13/08
摘要:
A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper includes a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material. The support member is larger in size than the intermediate layer and the patterned resin layer. The intermediate layer is more flexible than the patterned resin layer. Also, the patterned resin layer has a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
公开/授权文献
- US20090123590A1 NANOIMPRINT RESIN STAMPER 公开/授权日:2009-05-14
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