发明授权
- 专利标题： Rinse method and developing apparatus
- 专利标题（中）： 冲洗方法和显影装置
-
申请号： US11602390申请日： 2006-11-21
-
公开(公告)号： US08029624B2公开(公告)日： 2011-10-04
- 发明人: Kousuke Yoshihara , Junji Nakamura , Hirofumi Takeguchi , Taro Yamamoto
- 申请人： Kousuke Yoshihara , Junji Nakamura , Hirofumi Takeguchi , Taro Yamamoto
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Smith, Gambrell & Russell, LLP
- 优先权： JP2005-343914 20051129
- 主分类号： B08B7/04
- IPC分类号： B08B7/04
摘要：
A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.
公开/授权文献
- US20070119479A1 Rinse method and developing apparatus 公开/授权日：2007-05-31