发明授权
- 专利标题: Plasma generation apparatus
- 专利标题(中): 等离子体发生装置
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申请号: US12111903申请日: 2008-04-29
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公开(公告)号: US08035056B2公开(公告)日: 2011-10-11
- 发明人: Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
- 申请人: Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
- 申请人地址: KR Gyeonggi-Do
- 专利权人: Jusung Engineering Co., Ltd.
- 当前专利权人: Jusung Engineering Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Portland IP Law LLC
- 优先权: KR2005-13187 20050217
- 主分类号: B23K10/00
- IPC分类号: B23K10/00
摘要:
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
公开/授权文献
- US20090183834A1 PLASMA GENERATION APPARATUS 公开/授权日:2009-07-23
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