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公开(公告)号：US07411148B2
公开(公告)日：2008-08-12
申请号：US11356947
申请日：2006-02-16
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 供应处理气体的气体供应器; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。
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公开(公告)号：US08035056B2
公开(公告)日：2011-10-11
申请号：US12111903
申请日：2008-04-29
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
IPC分类号： B23K10/00
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。
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公开(公告)号：US20060191880A1
公开(公告)日：2006-08-31
申请号：US11356947
申请日：2006-02-16
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。
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公开(公告)号：US07088047B2
公开(公告)日：2006-08-08
申请号：US11043207
申请日：2005-01-26
申请人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
发明人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
CPC分类号： H01J37/321 , H05H1/46
摘要： An inductively coupled plasma generator having a lower aspect ratio reaction gas, comprising a chamber having a gas inlet through which a reaction gas is supplied, a vacuum pump for maintaining the inside of the chamber vacuum and a gas outlet for exhausting the reaction gas after completion of the reaction, a chuck for mounting a target material to be processed inside the chamber, and an antenna to which high-frequency power is applied, the antenna provided at the upper and lateral portions of the chamber, wherein the antenna has parallel antenna elements in which a discharge of a high frequency can be allowed and impedance is low to ensure a low electron temperature, the antenna is disposed such that a powered end of each of the antenna elements and a ground end of each of the antenna elements opposite to the powered end are symmetrical in view of the center of an imaginary circle formed by the antenna to establish rotation symmetry of plasma density profiles, the antenna elements are twisted in a helical manner, and the powered end of each of the antenna elements is positioned to be far from the chamber and the ground end of each of the antenna elements is positioned to be close to the chamber, thereby compensating for a drop in the plasma density due to ion loss occurring at the powered end.
摘要翻译： 一种具有较低纵横比的反应气体的电感耦合等离子体发生器，包括具有供应反应气体的气体入口的室，用于维持室内真空的真空泵和用于在完成后排出反应气体的气体出口 的反应，用于在室内安装待处理的目标材料的卡盘以及设置在室的上部和外侧部分处的高频电力的天线，其中天线具有平行的天线元件 其中可以允许高频放电并且阻抗低以确保低电子温度，天线被布置成使得每个天线元件的动力端和每个天线元件的接地端与 鉴于由天线形成的假想圆的中心，以建立等离子体密度分布的旋转对称性，动力端对称，天线元件ar e以螺旋方式扭绞，并且每个天线元件的动力端定位成远离腔室，并且每个天线元件的接地端被定位成靠近腔室，从而补偿了下降 由于在动力端发生离子损失引起的等离子体密度。
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公开(公告)号：US20050156530A1
公开(公告)日：2005-07-21
申请号：US11043207
申请日：2005-01-26
申请人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
发明人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
IPC分类号： H01J7/24 , H01J37/32 , H01L21/3065 , H05H1/24 , H05H1/46
CPC分类号： H01J37/321 , H05H1/46
摘要： An inductively coupled plasma generator having a lower aspect ratio reaction gas, comprising a chamber having a gas inlet through which a reaction gas is supplied, a vacuum pump for maintaining the inside of the chamber vacuum and a gas outlet for exhausting the reaction gas after completion of the reaction, a chuck for mounting a target material to be processed inside the chamber, and an antenna to which high-frequency power is applied, the antenna provided at the upper and lateral portions of the chamber, wherein the antenna has parallel antenna elements in which a discharge of a high frequency can be allowed and impedance is low to ensure a low electron temperature, the antenna is disposed such that a powered end of each of the antenna elements and a ground end of each of the antenna elements opposite to the powered end are symmetrical in view of the center of an imaginary circle formed by the antenna to establish rotation symmetry of plasma density profiles, the antenna elements are twisted in a helical manner, and the powered end of each of the antenna elements is positioned to be far from the chamber and the ground end of each of the antenna elements is positioned to be close to the chamber, thereby compensating for a drop in the plasma density due to ion loss occurring at the powered end.
摘要翻译： 一种具有较低纵横比的反应气体的电感耦合等离子体发生器，包括具有供应反应气体的气体入口的腔室，用于维持腔室真空内部的真空泵和用于在完成后排出反应气体的气体出口 的反应，用于在室内安装待处理的目标材料的卡盘以及设置在室的上部和外侧部分处的高频电力的天线，其中天线具有平行的天线元件 其中可以允许高频放电并且阻抗低以确保低电子温度，天线被布置成使得每个天线元件的动力端和每个天线元件的接地端与 鉴于由天线形成的假想圆的中心，以建立等离子体密度分布的旋转对称性，动力端对称，天线元件ar e以螺旋方式扭曲，并且每个天线元件的动力端定位成远离腔室，并且每个天线元件的接地端被定位成靠近腔室，从而补偿了下降 由于在动力端发生离子损失引起的等离子体密度。
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公开(公告)号：US07079085B2
公开(公告)日：2006-07-18
申请号：US10766665
申请日：2004-01-27
申请人： Young-Kwan Lee , Sang-Won Lee , Sae-Hoon Uhm
发明人： Young-Kwan Lee , Sang-Won Lee , Sae-Hoon Uhm
CPC分类号： H01J37/321 , H05H1/46
摘要： An antenna structure for an inductively coupled plasma generator suitable for processing large-diameter wafers or large, flat-panel display devices by making a plasma density distribution uniform and symmetrical with respect to a rotating direction inside a circular or rectangular chamber in which a wafer is processed. In the antenna structure having a powered end to which RF power is applied and a ground end connected to the ground, at least two loop antenna elements are disposed electrically in parallel with each other, the powered ends and ground ends of the respective antennas are disposed symmetrically with respect to the center of the antennas, and the antennas crossing each other such that the powered ends and ground ends thereof are disposed at a part far from a chamber and central parts thereof are disposed at a part close to the chamber.
摘要翻译： 一种用于电感耦合等离子体发生器的天线结构，其适用于通过使等离子体密度分布在圆形或矩形室内相对于旋转方向均匀且对称的方式处理大直径晶片或大型平板显示装置，其中晶片为 处理。 在具有施加RF功率的动力端和连接到地面的接地端的天线结构中，至少两个环形天线元件彼此并联设置，各个天线的动力端和接地端被布置 相对于天线的中心对称，并且天线彼此交叉，使得其动力端和接地端设置在远离室的一部分处，并且其中心部分设置在靠近室的部分。
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