发明授权
- 专利标题： Higher order silane composition, method for manufacturing film-coated substrate, electro-optical device and electronic device
- 专利标题（中）： 高级硅烷组合物，薄膜基材的制造方法，电光装置和电子装置
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申请号： US11972306申请日： 2008-01-10
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公开(公告)号： US08038972B2公开(公告)日： 2011-10-18
- 发明人: Takashi Masuda , Makoto Kato , Hideki Tanaka
- 申请人： Takashi Masuda , Makoto Kato , Hideki Tanaka
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2007-009566 20070118
- 主分类号： C01B33/04
- IPC分类号： C01B33/04 ; C04B41/50 ; C04B35/00 ; B05D3/02
摘要：
A higher order silane composition, includes: a higher order silane compound; and a solvent containing one of a substituted hydrocarbon based solvent and an unsubstituted hydrocarbon based solvent. As the solvent, a solvent having a refractive index of 1.53 or more is selected so that the higher order silane compound is dissolved therein.
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