发明授权
- 专利标题： Method and apparatus for cleaning a substrate using non-Newtonian fluids
- 专利标题（中）： 使用非牛顿流体清洗基材的方法和设备
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申请号： US11153957申请日： 2005-06-15
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公开(公告)号： US08043441B2公开(公告)日： 2011-10-25
- 发明人: John M. de Larios , Mike Ravkin , Jeffrey Farber , Mikhail Korolik , Fred C. Redeker
- 申请人： John M. de Larios , Mike Ravkin , Jeffrey Farber , Mikhail Korolik , Fred C. Redeker
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Martine Penilla & Gencarella, LLP
- 主分类号： B08B3/00
- IPC分类号： B08B3/00
摘要：
A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with the portion of the flow that exhibits plug flow such that the portion of the flow exhibiting plug flow moves over the surface of the substrate. Additional methods and apparatuses for cleaning a substrate also are described.
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