Invention Grant
US08045145B1 Systems and methods for acquiring information about a defect on a specimen
有权
用于获取关于样本缺陷的信息的系统和方法
- Patent Title: Systems and methods for acquiring information about a defect on a specimen
- Patent Title (中): 用于获取关于样本缺陷的信息的系统和方法
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Application No.: US11759090Application Date: 2007-06-06
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Publication No.: US08045145B1Publication Date: 2011-10-25
- Inventor: Dave Bakker , Gabor Toth , Varoujan Chakarian
- Applicant: Dave Bakker , Gabor Toth , Varoujan Chakarian
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corp.
- Current Assignee: KLA-Tencor Technologies Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
Systems and methods for acquiring information about a defect on a specimen are provided. One system includes an optical subsystem configured to acquire topography information about the defect. The system also includes an electron beam subsystem configured to acquire additional information about the defect. One method includes acquiring first data for the defect using an optical technique and second data for the defect using an electron beam technique. The first and second data is acquired while the specimen is disposed in a single vacuum chamber. The method also includes determining topography information about the defect from the first data. In addition, the method includes determining additional information about the defect from the second data.
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