发明授权
- 专利标题: Method for manufacturing display device
- 专利标题(中): 显示装置制造方法
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申请号: US11823410申请日: 2007-06-27
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公开(公告)号: US08048473B2公开(公告)日: 2011-11-01
- 发明人: Shunpei Yamazaki , Hironobu Shoji , Ikuko Kawamata
- 申请人: Shunpei Yamazaki , Hironobu Shoji , Ikuko Kawamata
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Husch Blackwell LLP
- 优先权: JP2006-184713 20060704
- 主分类号: B05D5/08
- IPC分类号: B05D5/08 ; H01B13/00 ; C23F1/00
摘要:
When a mask layer is formed, a first liquid composition containing a mask-layer-forming material is applied on an outer side of a pattern that is desired to be formed (corresponding to a contour or an edge portion of a pattern) to form a first mask layer having a frame shape. A second liquid composition containing a mask-layer-forming material is applied so as to fill a space inside the first mask layer having a frame shape to form a second mask layer. The first mask layer and the second mask layer are formed to be in contact with each other, and the first mask layer is formed to surround the second mask layer. Therefore, the first mask layer and the second mask layer can be used as one continuous mask layer.
公开/授权文献
- US20080044744A1 Method for manufacturing display device 公开/授权日:2008-02-21
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