发明授权
- 专利标题: Method for removing foreign matter from substrate surface
- 专利标题(中): 从基材表面除去异物的方法
-
申请号: US11552269申请日: 2006-10-24
-
公开(公告)号: US08052797B2公开(公告)日: 2011-11-08
- 发明人: Yoshiaki Ikuta
- 申请人: Yoshiaki Ikuta
- 申请人地址: JP Tokyo
- 专利权人: Asahi Glass Company, Limited
- 当前专利权人: Asahi Glass Company, Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: B08B3/04
- IPC分类号: B08B3/04 ; B08B3/08
摘要:
A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm2 in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH ≦6.