发明授权
US08053376B2 One-step synthesis and patterning of aligned polymer nanowires on a substrate
有权
在底物上对齐聚合物纳米线的一步合成和图案化
- 专利标题: One-step synthesis and patterning of aligned polymer nanowires on a substrate
- 专利标题(中): 在底物上对齐聚合物纳米线的一步合成和图案化
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申请号: US12492333申请日: 2009-06-26
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公开(公告)号: US08053376B2公开(公告)日: 2011-11-08
- 发明人: Zhong L. Wang , Xudong Wang , Jenny R. Morber , Jin Liu
- 申请人: Zhong L. Wang , Xudong Wang , Jenny R. Morber , Jin Liu
- 申请人地址: US GA Atlanta
- 专利权人: Georgia Tech Research Corporation
- 当前专利权人: Georgia Tech Research Corporation
- 当前专利权人地址: US GA Atlanta
- 代理机构: Bockhop & Associates, LLC
- 代理商 Bryan W. Bockhop
- 主分类号: H01L21/31
- IPC分类号: H01L21/31 ; H01L21/469
摘要:
In a method of making a polymer structure on a substrate a layer of a first polymer, having a horizontal top surface, is applied to a surface of the substrate. An area of the top surface of the polymer is manipulated to create an uneven feature that is plasma etched to remove a first portion from the layer of the first polymer thereby leaving the polymer structure extending therefrom. A light emitting structure includes a conductive substrate from which an elongated nanostructure of a first polymer extends. A second polymer coating is disposed about the nanostructure and includes a second polymer, which includes a material such that a band gap exists between the second polymer coating and the elongated nanostructure. A conductive material coats the second polymer coating. The light emitting structure emits light when a voltage is applied between the conductive substrate and the conductive coating.
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