One-step synthesis and patterning of aligned polymer nanowires on a substrate
    1.
    发明授权
    One-step synthesis and patterning of aligned polymer nanowires on a substrate 有权
    在底物上对齐聚合物纳米线的一步合成和图案化

    公开(公告)号:US08053376B2

    公开(公告)日:2011-11-08

    申请号:US12492333

    申请日:2009-06-26

    IPC分类号: H01L21/31 H01L21/469

    摘要: In a method of making a polymer structure on a substrate a layer of a first polymer, having a horizontal top surface, is applied to a surface of the substrate. An area of the top surface of the polymer is manipulated to create an uneven feature that is plasma etched to remove a first portion from the layer of the first polymer thereby leaving the polymer structure extending therefrom. A light emitting structure includes a conductive substrate from which an elongated nanostructure of a first polymer extends. A second polymer coating is disposed about the nanostructure and includes a second polymer, which includes a material such that a band gap exists between the second polymer coating and the elongated nanostructure. A conductive material coats the second polymer coating. The light emitting structure emits light when a voltage is applied between the conductive substrate and the conductive coating.

    摘要翻译: 在将衬底上形成聚合物结构的方法中,将具有水平顶表面的第一聚合物层施加到衬底的表面上。 操作聚合物顶表面的区域以产生等离子体蚀刻以从第一聚合物层移除第一部分从而使聚合物结构从其延伸的不均匀特征。 发光结构包括第一聚合物的细长纳米结构延伸的导电基底。 第二聚合物涂层围绕纳米结构设置并且包括第二聚合物,其包括使第二聚合物涂层和细长纳米结构之间存在带隙的材料。 导电材料涂覆第二聚合物涂层。 当在导电基板和导电涂层之间施加电压时,发光结构发光。