发明授权
- 专利标题： Chemically amplified positive resist composition
- 专利标题（中）： 化学放大正光刻胶组合物
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申请号： US12425942申请日： 2009-04-17
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公开(公告)号： US08057983B2公开(公告)日： 2011-11-15
- 发明人: Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
- 申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
- 申请人地址： JP Tokyo
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2008-110430 20080421
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
公开/授权文献
- US20090269695A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 公开/授权日：2009-10-29
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