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    Chemically amplified positive resist composition
    1.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US08057983B2

    公开(公告)日：2011-11-15

    申请号：US12425942

    申请日：2009-04-17

    申请人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    发明人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).

    摘要翻译： 本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团， 在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

    Chemically amplified positive resist composition
    2.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US08062830B2

    公开(公告)日：2011-11-22

    申请号：US12425759

    申请日：2009-04-17

    申请人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    发明人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.

    摘要翻译： 本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团， 在侧链中具有内酯结构的单元（b4）和酸产生剂，其中基于树脂（B）的总单元的结构单元（b1）的含量小于10摩尔％。

    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    3.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
    化学放大正电阻组合物

    公开(公告)号：US20090269695A1

    公开(公告)日：2009-10-29

    申请号：US12425942

    申请日：2009-04-17

    申请人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    发明人： Yusuke Fuji ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Nobuo Ando ,  Ichiki Takemoto

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).

    摘要翻译： 本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团， 在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

    RESIST PROCESSING METHOD
    4.
    发明申请
    RESIST PROCESSING METHOD 审中-公开
    电阻加工方法

    公开(公告)号：US20100279226A1

    公开(公告)日：2010-11-04

    申请号：US12810793

    申请日：2008-12-22

    申请人： Mitsuhiro Hata ,  Yoshiyuki Takata ,  Satoshi Yamaguchi ,  Ichiki Takemoto ,  Takayuki Miyagawa ,  Yusuke Fuji

    发明人： Mitsuhiro Hata ,  Yoshiyuki Takata ,  Satoshi Yamaguchi ,  Ichiki Takemoto ,  Takayuki Miyagawa ,  Yusuke Fuji

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： H01L21/0275 ,  G03F7/0035 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/40

    摘要： The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.

    摘要翻译： 本发明的目的是提供一种制造抗蚀剂图案的方法，其中可以形成极细和高精度的抗蚀剂图案，该抗蚀剂图案是使用多图案化方法中形成第一抗蚀剂图案的抗蚀剂组合物获得的， 双重图案化方法 抗蚀剂处理方法包括： 通过将第一抗蚀剂组合物施加到基材上并干燥来形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含树脂（A），光酸产生剂（B）和交联剂（C），树脂（A） 具有酸不稳定基团，在碱性水溶液中不溶或难溶，但通过酸的作用使其溶于碱水溶液中; 预烘烤 曝光处理; 曝光后烘烤; 发展; 硬烘烤第一抗蚀剂图案; 得到第二抗蚀膜; 预烘烤; 曝光处理; 曝光后烘烤; 显影以获得第二抗蚀剂图案。

    Chemically amplified positive resist composition
    9.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US08003296B2

    公开(公告)日：2011-08-23

    申请号：US12536386

    申请日：2009-08-05

    申请人： Masahiko Shimada ,  Kazuhiko Hashimoto ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Satoshi Yamamoto

    发明人： Masahiko Shimada ,  Kazuhiko Hashimoto ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Satoshi Yamamoto

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.

    摘要翻译： 本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于 酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键 或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    10.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
    化学放大正电阻组合物

    公开(公告)号：US20100010129A1

    公开(公告)日：2010-01-14

    申请号：US12490828

    申请日：2009-06-24

    申请人： Junji Shigematsu ,  Kunishige Edamatsu ,  Takayuki Miyagawa ,  Akira Kamabuchi

    发明人： Junji Shigematsu ,  Kunishige Edamatsu ,  Takayuki Miyagawa ,  Akira Kamabuchi

    IPC分类号： C08K5/42 ,  C08L37/00 ,  C08L55/00

    CPC分类号： G03F7/0397 ,  G03F7/0046

    摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.

    摘要翻译： 本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有 侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基 表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。