发明授权
US08062717B2 RF current return path for a large area substrate plasma reactor
失效
用于大面积衬底等离子体反应器的RF电流返回路径
- 专利标题： RF current return path for a large area substrate plasma reactor
- 专利标题（中）： 用于大面积衬底等离子体反应器的RF电流返回路径
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申请号： US11425679申请日： 2006-06-21
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公开(公告)号： US08062717B2公开(公告)日： 2011-11-22
- 发明人: Wendell Blonigan , Ernst Keller , Carl Sorensen
- 申请人： Wendell Blonigan , Ernst Keller , Carl Sorensen
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, L.L.P.
- 主分类号： H05H1/24
- IPC分类号： H05H1/24
摘要：
An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
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