摘要:
A method and apparatus for monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing system is provided. In one embodiment, a processing chamber is provided that includes a ground path member coupled between a substrate support and a chamber body. A sensor is positioned to sense a metric indicative of current passing through the ground member. In another embodiment, a method monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing chamber includes monitoring a metric indicative of current passing through the ground member during processing, and setting a flag in response to the metric exceeding a predefined threshold.
摘要:
A method of selecting a geometry for a friction stirring tool, said tool having a melting point that is higher than the workpiece material, wherein the tool is placed in motion against the workpiece to generate heat in the workpiece such that workpiece material is transported in surface features of the tool, and wherein surface features manage workpiece material flow around the tool, and wherein the tool can be used in friction stir processing, friction stir mixing, friction stir welding, and friction stir spot welding of high melting temperature materials or high softening temperature materials.
摘要:
An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
摘要:
A method and apparatus for monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing system is provided. In one embodiment, a processing chamber is provided that includes a ground path member coupled between a substrate support and a chamber body. A sensor is positioned to sense a metric indicative of current passing through the ground member. In another embodiment, a method monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing chamber includes monitoring a metric indicative of current passing through the ground member during processing, and setting a flag in response to the metric exceeding a predefined threshold.
摘要:
A probe for friction stir welding MMCs, ferrous alloys, non-ferrous alloys, and superalloys, as well as non-ferrous alloys, the probe including a shank, a shoulder, and a pin disposed through the shoulder and into the shank, wherein the pin and the shoulder at least include a coating comprised of a superabrasive material, the Din and shoulder being designed to reduce stress risers, disposing a collar around a portion of the shoulder and the shank to thereby prevent movement of the shoulder relative to the shank, and incorporating thermal management by providing a thermal flow barrier between the shoulder and the shank, and between the collar and the tool.
摘要:
In certain aspects, a plasma chamber is provided that has (1) a chamber size of at least about 1.8 by 2.0 meters; and (2) an effective inductance having an inductive reactance of not more than about 12-15 ohms. The plasma chamber may be used, for example, to process substrates used for flat panel displays. Numerous other aspects are provided.
摘要:
Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要:
A friction stir welding anvil and method of producing a friction stir welding anvil that precludes diffusion or mechanical bonding of the anvil to the work pieces are provided. The alternatives for producing such an anvil comprise coating the anvil with diffusion barriers such as oxides, nitrides, intermetallics, and/or refractory metals; manufacturing an anvil either completely or partially from the same; or placing a coating of such materials in the form of a thin sheet or a powder between the anvil and the work pieces. The anvil disclosed herein exhibits high strength and hardness even at elevated temperatures, such as those greater than 800° C., so as to prevent the anvil from mechanically or diffusion bonding to the work pieces and so as to minimize, or eliminate altogether, anvil deformation.
摘要:
A four post ROPS is provided with left and right front vertical posts and left and right rear vertical posts. The rear vertical posts have a bottom portion that extends upwardly, forwardly and outwardly from the floor of the operator's station. Each left and right front vertical post has an arrowhead shaped cross section. The arrow shaped cross section has a main lobe, a secondary lobe and a connecting portion located between the two lobes. The arrowhead shaped cross section defines a windshield channel for receiving the side edge of the windshield, and a side door channel for receiving the side edge of the side door. The arrowhead shape has an elongated axis that is in line with the line of sight of the operator when driving the backhoe loader.
摘要:
Embodiments of the disclosure generally provide a method and apparatus for processing a substrate in a vacuum process chamber. In one embodiment a vacuum process chamber is provided that includes a chamber body and lid disposed on the chamber body. A blocker plate is coupled to the lid and bounds a staging plenum therewith. A gas distribution plate is coupled to the lid. The gas distribution plate separates a main plenum defined between the gas distribution plate and the blocker plate from a process volume defined within the chamber body. The gas distribution plate and the blocker plate define a spacing gradient therebetween which influences mixing of gases within the main plenum.