A process for poling a ferroelectric material doped with a metal, which process comprises: (i) defining an electrode pattern on a −z face of a crystal of the ferroelectric material doped with the metal; (ii) providing an electrode material; (iii) poling at a temperature of not more than 45° C.; and (iv) poling by a two-stage voltage-controlled application of electric field based on a first poling stage of domain nucleation and a second poling stage of domain spreading.