发明授权
- 专利标题: Coating film processing method and apparatus
- 专利标题(中): 涂膜处理方法和装置
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申请号: US11950122申请日: 2007-12-04
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公开(公告)号: US08069816B2公开(公告)日: 2011-12-06
- 发明人: Taro Yamamoto , Kousuke Yoshihara
- 申请人: Taro Yamamoto , Kousuke Yoshihara
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-340186 20061218
- 主分类号: B05C11/02
- IPC分类号: B05C11/02 ; B05C11/00 ; B05B7/06 ; G03D5/00
摘要:
A coating film processing method is used for processing a coating film formed on a surface of a substrate to prepare for an immersion light exposure process arranged to perform light exposure through a liquid. The method includes supplying a solvent-containing liquid comprising a combination of a solvent and a solvent-ability decreasing agent for decreasing solvent ability, or a diluted solvent, onto an edge portion of the coating film, thereby performing edge portion cutting; and supplying a cleaning liquid onto the edge portion of the coating film, thereby performing edge portion cleaning, subsequently to the edge portion cutting.
公开/授权文献
- US20080142043A1 COATING FILM PROCESSING METHOD AND APPARATUS 公开/授权日:2008-06-19
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