发明授权
- 专利标题: High density resistance based semiconductor device
- 专利标题(中): 基于高密度电阻的半导体器件
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申请号: US12204515申请日: 2008-09-04
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公开(公告)号: US08072793B2公开(公告)日: 2011-12-06
- 发明人: Ming-Daou Lee , Erh-Kun Lai , Kuang Yeu Hsieh
- 申请人: Ming-Daou Lee , Erh-Kun Lai , Kuang Yeu Hsieh
- 申请人地址: TW Hsinchu
- 专利权人: Macronix International Co., Ltd.
- 当前专利权人: Macronix International Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Haynes Beffel & Wolfeld LLP
- 主分类号: G11C11/00
- IPC分类号: G11C11/00
摘要:
Memory devices are described along with methods for manufacturing. A memory device as described herein includes a plurality of memory cells located between word lines and bit lines. Each memory cell comprises a diode and a plurality of memory elements each comprising one or more metal-oxygen compounds, the diode and the plurality of memory elements arranged in electrical series along a current path between a corresponding word line and a corresponding bit line.
公开/授权文献
- US20100054014A1 HIGH DENSITY RESISTANCE BASED SEMICONDUCTOR DEVICE 公开/授权日:2010-03-04
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