Invention Grant
US08085288B2 Exposure system with a plurality of laser sources located at dispersed sites
有权
具有位于分散位置的多个激光源的曝光系统
- Patent Title: Exposure system with a plurality of laser sources located at dispersed sites
- Patent Title (中): 具有位于分散位置的多个激光源的曝光系统
-
Application No.: US12081399Application Date: 2008-04-15
-
Publication No.: US08085288B2Publication Date: 2011-12-27
- Inventor: Satoshi Yasuda , Mamoru Fujimoto , Hiroshi Iwasa
- Applicant: Satoshi Yasuda , Mamoru Fujimoto , Hiroshi Iwasa
- Applicant Address: JP Kyoto
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-111683 20070420
- Main IPC: B41J2/435
- IPC: B41J2/435 ; B41J2/47

Abstract:
A CTP system is provided, which allows its continuous use even if some of laser diodes located at dispersed sites are in a non-light emitting state due to breakage or the like. In the case where some channels are in the non-light emitting state, channel-by-channel exposure data is generated to describe the way that exposure should be performed by use of specific light-emitting channels that are determined by the locations of non-light emitting channels, while an exposure head is moved also through (a) complementary interval(s) before and/or after a standard interval, the standard interval being the interval the exposure head is moved through in normal mode. Then, the transport unit moves the exposure head through the standard interval and through the complementary interval(s), during which period the exposure controller causes the specific light-emitting channels to emit exposure light according to the channel-by-channel exposure data, thereby forming an exposed area.
Public/Granted literature
- US20080259301A1 Exposure system Public/Granted day:2008-10-23
Information query
IPC分类: