发明授权
- 专利标题: Electron beam inspection system and an image generation method for an electron beam inspection system
- 专利标题(中): 电子束检查系统和电子束检查系统的图像生成方法
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申请号: US12179272申请日: 2008-07-24
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公开(公告)号: US08086022B2公开(公告)日: 2011-12-27
- 发明人: Hiroshi Miyai , Yusuke Ominami , Yasuhiro Gunji
- 申请人: Hiroshi Miyai , Yusuke Ominami , Yasuhiro Gunji
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Crowell & Moring LLP
- 优先权: JP2007-193244 20070725
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; G06K9/40 ; G01N23/00
摘要:
An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.
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