公开(公告)号：US20140151553A1

公开(公告)日：2014-06-05

申请号：US14235892

申请日：2012-07-04

申请人： Yusuke Ominami ,  Tomohisa Ohtaki ,  Sukehiro Ito

发明人： Yusuke Ominami ,  Tomohisa Ohtaki ,  Sukehiro Ito

IPC分类号： H01J37/06

CPC分类号： H01J37/18 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/166 ,  H01J2237/18 ,  H01J2237/202 ,  H01J2237/2445 ,  H01J2237/2608

摘要： A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.

摘要翻译： 能够在空气气氛或气体气氛中观察样品的带电粒子束装置具有用于将压缩空间与减压空间分离的薄膜。 真空排气泵抽出第一壳体; 并且检测器检测在第一壳体中的带电粒子束（通过样品的照射获得）。 提供薄膜以至少沿着第一和第二壳体之间的界面的一部分分离第一壳体的内部和第二壳体的内部。 在薄膜中形成开口部，使得带电粒子照射单元侧的开口面积大于样品侧的开口面积; 并且覆盖开口部的样品侧的薄膜透过或允许通过初级带电粒子束和带电粒子束。

公开(公告)号：US20100314542A1

公开(公告)日：2010-12-16

申请号：US12860363

申请日：2010-08-20

申请人： Yusuke OMINAMI ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

发明人： Yusuke OMINAMI ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

IPC分类号： H01J37/244 ,  H01J37/26

CPC分类号： G01R31/307

摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

摘要翻译： 具有噪声减除​​功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器， 装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

公开(公告)号：US09165741B2

公开(公告)日：2015-10-20

申请号：US14235892

申请日：2012-07-04

申请人： Yusuke Ominami ,  Tomohisa Ohtaki ,  Sukehiro Ito

发明人： Yusuke Ominami ,  Tomohisa Ohtaki ,  Sukehiro Ito

IPC分类号： H01J37/06 ,  H01J37/18 ,  H01J37/28

CPC分类号： H01J37/18 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/166 ,  H01J2237/18 ,  H01J2237/202 ,  H01J2237/2445 ,  H01J2237/2608

摘要： A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.

摘要翻译： 能够在空气气氛或气体气氛中观察样品的带电粒子束装置具有用于将压缩空间与减压空间分离的薄膜。 真空排气泵抽出第一壳体; 并且检测器检测在第一壳体中的带电粒子束（通过样品的照射获得）。 提供薄膜以至少沿着第一和第二壳体之间的界面的一部分分离第一壳体的内部和第二壳体的内部。 在薄膜中形成开口部，使得带电粒子照射单元侧的开口面积大于样品侧的开口面积; 并且覆盖开口部的样品侧的薄膜透过或允许通过初级带电粒子束和带电粒子束。

公开(公告)号：US08710439B2

公开(公告)日：2014-04-29

申请号：US14111174

申请日：2012-03-02

申请人： Yusuke Ominami ,  Sukehiro Ito ,  Tomohisa Ohtaki

发明人： Yusuke Ominami ,  Sukehiro Ito ,  Tomohisa Ohtaki

IPC分类号： H01J37/28 ,  H01J37/20 ,  G01N13/10

CPC分类号： H01J37/18 ,  H01J37/16 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/16 ,  H01J2237/164 ,  H01J2237/1825 ,  H01J2237/2007 ,  H01J2237/2608

摘要： Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.

公开(公告)号：US08658987B2

公开(公告)日：2014-02-25

申请号：US13577719

申请日：2011-02-21

申请人： Takuma Yamamoto ,  Takashi Hiroi ,  Yusuke Ominami

发明人： Takuma Yamamoto ,  Takashi Hiroi ,  Yusuke Ominami

IPC分类号： G01N23/225

CPC分类号： H01J37/28 ,  H01J2237/2811 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is a circuit-pattern inspection device which enables efficient inspection of a semiconductor wafer by selectively inspecting areas on the semiconductor wafer, such as boundaries between patterns thereon, where defects are likely to occur during the step of producing the semiconductor wafer while changing the beam scanning direction for each area. Two-dimensional beam-deflection control is employed for inspection operations in a continuous-stage-movement-type circuit-pattern inspection device in which only one-dimensional scanning has been employed conventionally. That is, by employing a combination of an electron-beam-deflection control in a first direction parallel to the stage-movement direction and an electron-beam-deflection control in a second direction intersecting the stage-movement direction, it is possible to obtain an image of any desired area for inspection that is set within a swath. The amplitude of deflection signals for the electron-beam-deflection and the rise and fall timings of the signals are suitably controlled according to inspection conditions.

摘要翻译： 提供一种电路图案检查装置，其能够通过选择性地检查半导体晶片上的区域，例如在其上的图案之间的边界上的区域，从而有效地检查半导体晶片，其中在制造半导体晶片的步骤期间可能会发生缺陷，同时改变光束 每个区域的扫描方向。 在通常仅采用一维扫描的连续级移动型电路图案检查装置中，进行二维光束偏转控制。 也就是说，通过在平行于载物台移动方向的第一方向上的电子束偏转控制和与载物台移动方向相交的第二方向上的电子束偏转控制的组合，可以获得 任何所需的检查区域的图像，其设置在条纹内。 根据检查条件适当地控制电子束偏转的偏转信号的幅度和信号的上升和下降定时。

公开(公告)号：US08086021B2

公开(公告)日：2011-12-27

申请号：US12367695

申请日：2009-02-09

申请人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

发明人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

IPC分类号： G06K9/00

CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/221 ,  H01J2237/24495 ,  H01J2237/2485 ,  H01J2237/2817

摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.

摘要翻译： 本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。 外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。 此外，允许用户选择吞吐量提高或S / N改善以优先化。

公开(公告)号：US20110278452A1

公开(公告)日：2011-11-17

申请号：US13129201

申请日：2009-10-15

申请人： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

发明人： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

IPC分类号： H01J37/26 ,  H01J37/285

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/0048 ,  H01J2237/2008 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.

摘要翻译： 提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷， 电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。 还提供了使用图案检查装置的图案检查方法。 因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。 然后，检查结果反馈给操作。 这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

公开(公告)号：US20080308725A1

公开(公告)日：2008-12-18

申请号：US12132361

申请日：2008-06-03

申请人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

发明人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

IPC分类号： G01N23/00

CPC分类号： G01R31/307

摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

摘要翻译： 具有噪声减除​​功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器， 装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

公开(公告)号：US09543111B2

公开(公告)日：2017-01-10

申请号：US13982805

申请日：2011-11-02

申请人： Yusuke Ominami ,  Sukehiro Ito ,  Masami Katsuyama

发明人： Yusuke Ominami ,  Sukehiro Ito ,  Masami Katsuyama

IPC分类号： H01J37/28 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26

CPC分类号： H01J37/16 ,  H01J37/18 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2811

摘要： Provided is a charged particle beam device or charged particle microscope permitting observation of even a large-sized specimen in the air atmosphere or a gaseous atmosphere.A charged particle beam device that adopts a thin film which partitions a vacuum atmosphere and the air atmosphere (or gaseous atmosphere) includes a charged particle optical lens barrel in which a charged particle optical system is stored, a housing in which a route along which a primary charged particle beam emitted from the charged particle optical lens barrel reaches the thin film is sustained in the vacuum atmosphere, and a mechanism that bears the charged particle optical lens barrel and first housing against a device installation surface. As the bearing mechanism, a housing having an opening through which a large-sized specimen is carried in or a mechanism having a shape other than the shape of the housing, such as, a post is adopted.

摘要翻译： 采用分隔真空气氛的薄膜和空气气氛（或气体气氛）的带电粒子束装置包括其中存储带电粒子光学系统的带电粒子光学镜筒，其中沿着 从带电粒子光学透镜镜筒发射的到达薄膜的初级带电粒子束在真空气氛中被维持，并且使得带电粒子光学镜片镜筒和第一壳体抵抗装置安装​​表面的机构。 作为轴承机构，采用具有大尺寸样本的开口的壳体或具有除壳体的形状以外的形状的机构，例如柱。

公开(公告)号：US08835847B2

公开(公告)日：2014-09-16

申请号：US14114164

申请日：2012-04-20

申请人： Toshie Yaguchi ,  Akira Watabe ,  Yusuke Ominami

发明人： Toshie Yaguchi ,  Akira Watabe ,  Yusuke Ominami

IPC分类号： G01N23/00 ,  G21K7/00 ,  H01J37/20 ,  H01J37/26

CPC分类号： H01J37/20 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/2003 ,  H01J2237/2065

摘要： A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam.

摘要翻译： 用于电子显微镜的样品保持装置包括：样品保持组件，其包括上隔膜保持部，样品保持板和下隔膜保持部的三个部件的组件; 以及可替换地保持样品保持组件的保持部。 样品保持组件包括限定在上隔膜保持部的隔膜和下隔膜保持部的隔膜之间的单元，以及连接到电池的流路，其中安装在样品保持板的突起处的样品为 放置 上隔膜保持部的隔膜，下隔膜保持部的检体和隔膜沿电子束的光轴配置。